Double target magnetron sputtering coater is a cost-effective magnetron sputtering coater independently developed by our company, which has the characteristics of standardization, modularization and customization. The magnetic control target has a choice of 1 inch and 2 inches, and customers can choose according to the size of the plated substrate; The power supply is two 500W DC power supplies, which can be used for the preparation of metal films, and the two targets can meet the needs of multi-layer or multiple coatings.

The coater has two high-precision mass flow meters. If customers have other requirements, they can customize the gas path of up to four mass flow meters to meet the complex gas environment construction needs. The instrument comes standard with an advanced turbomolecular pump set with a limit vacuum of up to 1.0E-5Pa, while other types of molecular pumps are available. The gas route of the molecular pump is controlled by multiple solenoid valves, which can realize the opening of the chamber to remove the sample without the pump, greatly improving your work efficiency. This product can be selected as an industrial computer to control the system, in the computer program can achieve the control of vacuum pump group, sputtering power control and other most of the functions, can further improve your experimental efficiency.

Dual-target magnetron sputtering coating instrument Scope of application:

Dual-target magnetron sputtering coater can be used to prepare single or multi-layer ferroelectric films, conductive films, alloy films, etc. Compared with similar equipment, the double-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for preparing material films in laboratory.