Electron beam evaporation coating equipment is mainly used for the preparation of various conductive films, semiconductor films, ferroelectric films, optical films, micro and nano devices micro-processing, electron microscope sample pretreatment, especially suitable for evaporation of various refractory metal materials. Not only can be used for glass, silicon and other hard substrates, but also can be used for PDMS, PTFE, PI and other flexible substrates coating.
The High Vacuum Electron Beam Evaporation Coater is a precision tool designed for depositing thin films through electron beam evaporation under high vacuum conditions. Ideal for research and industrial applications, it ensures uniform coatings with excellent purity and adhesion. Its advanced design supports a wide range of materials, making it suitable for semiconductors, optics, and nanotechnology. The system features a compact footprint, user-friendly controls, and customizable configurations, enabling efficient and versatile operation in both laboratory and manufacturing environments.