Plasma Sputtering Coater is a sophisticated device utilized for applying thin films onto various substrates. It operates on the principle of sputtering, where a plasma is created in an evacuated chamber, causing atoms of a target material to be ejected and subsequently deposited onto the substrate. This technique is crucial for applications requiring high-quality coatings, such as in microelectronics, semiconductor manufacturing, and sample preparation for scanning electron microscopy (SEM). The sputtering process ensures uniform and precise film deposition, even on complex geometries. Advanced features like load locks and cryo-pumping make Plasma Sputtering Coaters versatile tools for research and industry, catering to the need for high-resolution coatings in nanotechnology and materials science. 

This instrument is also equipped with a rotating sample table, which can effectively improve the uniformity of the coating. (The equipment is equipped with a rotating heating sample table, which can improve the uniformity of the coating and the adhesion of the film) The small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. Small size and beautiful shape of the equipment, is the best choice for laboratory coating test.