The rubber leveling machine is mainly composed of a base, a rotating disk, a transmission device, an air pumping device, a annotation system and a digital display temperature controller. The preparation process can be divided into the following steps: the solution is placed on a rotating disc; Start the rotating disk for centrifugal action; Control the rotation speed and time to form the desired thickness of the film; The residual glue on the surface of the coating is removed by the exhaust device.

When used, the spin coater needs to prepare a certain number of solutions or mixtures of the required materials, usually using organic solvents or water as diluents, and adding surfactants to improve viscosity and surface tension. The formulation of the mixture should be determined according to the chemical properties and thickness of the desired film.

In addition, the spin coater uses an advanced precision motor, and its speed can reach a high level, such as 10,000 RPM, which effectively ensures the uniformity of film formation. At the same time, it may be controlled by a touch screen, which can be preset the uniform curve, thus greatly simplifying the use process and reducing the learning cost.

Please note that different spinning machines may have different characteristics and functions, so it is recommended to refer to the relevant product manual or consult a professional when selecting and using.

The main use of the spin coater is to evenly coat liquid or colloidal materials on silicon, crystal, quartz, ceramic and other substrates to form a film. This equipment is widely used in various fields, including but not limited to spin coating of photoresist, preparation of biological medium and preparation of polymeric films by sol-gel method.

Specifically, the spin coater rotates the substrate at a high speed and uses centrifugal force to distribute the adhesive liquid evenly on the surface of the substrate to form a uniform and dense film. The thickness and uniformity of this film can be adjusted by controlling the rotation speed and time to meet the needs of different applications.

In the spin coating of photoresist, the spin coater is used to prepare photoresist films on silicon wafers or other substrates, which is a key step in the manufacture of semiconductor devices and integrated circuits. In the production of biological medium, the homogenizer is used to prepare uniform biological medium films for cell culture and tissue engineering research. In addition, in the sol-gel method of polymer films, the spinning machine also plays an important role.

In general, the machine has a wide range of applications in material science, semiconductor manufacturing, biology and other fields, providing important technical support for scientific research and production.