Plasma cleaning machine is a miniaturized, non-destructive cleaning equipment. The plasma cleaning machine uses low pressure excited plasma as the cleaning medium, which effectively avoids the secondary pollution caused by the liquid cleaning medium to the cleaned material. The instrument is equipped with a mechanical vacuum pump, which can not only maintain the vacuum degree of the chamber, but also remove the pollutants after plasma reaction through the vacuum pump. Therefore, a short time of cleaning can make organic pollutants be thoroughly cleaned out.

Plasma cleaner is a new high-tech technology that uses plasma to achieve results that cannot be achieved by conventional cleaning methods. Plasma is a state of matter, also known as the fourth state of matter, and does not belong to the common solid-liquid-gas three states. Enough energy is applied to the gas to dissociate it into a plasma state. The "active" components of plasma include: ions, electrons, atoms, active groups, excited nuclides (metastable), photons, etc. Plasma cleaning machine is to use the properties of these active components to treat the sample surface, so as to achieve cleaning, coating and other purposes.

In addition to the cleaning function, this small plasma cleaning machine can also change the surface performance of some materials as needed under specific conditions. During the cleaning process, the glow discharge of the small plasma cleaning machine can enhance the adhesion, compatibility and wettability of these materials.

This plasma cleaner is suitable for laboratory and small scale production. The 13.56Mhz RF power supply can be used to match the plasma of various commonly used gases. The power of the RF power supply from 100W to 1000W is available in a variety of common specifications, which can meet the diversified needs of users.