Plasma Sputtering Coater is a sophisticated device utilized for applying thin films onto various substrates. It operates on the principle of sputtering, where a plasma is created in an evacuated chamber, causing atoms of a target material to be ejected and subsequently deposited onto the substrate. This technique is crucial for applications requiring high-quality coatings, such as in microelectronics, semiconductor manufacturing, and sample preparation for scanning electron microscopy (SEM). The sputtering process ensures uniform and precise film deposition, even on complex geometries. Advanced features like load locks and cryo-pumping make Plasma Sputtering Coaters versatile tools for research and industry, catering to the need for high-resolution coatings in nanotechnology and materials science. 

This type of transposition rotational plasma coater adopts two-stage sputtering mode and is widely used for SEM sample preparation or metal coating test. Low temperature plasma sputtering process, no high temperature in the coating process, not easy to produce thermal damage. The small transposition rotating plasma coater uses PLC control system, all touch screen operation, easy to learn and use. The transposition rotating plasma coater is equipped with a transposition rotating sample table, which allows users to achieve one-click transposition on the touch screen. The sample table can be freely switched between two target positions, and the sample table can also be rotated after it is in place to enhance the uniformity of the coating. In addition, customers can choose crystal vibration film thickness meter to monitor the film thickness to improve the accuracy of the coating.

This device is small in size, beautiful in shape and powerful in function, and is the best choice for laboratory coating test.