The three-target magnetron sputtering coater is a cost-effective magnetron sputtering coater independently developed by our company, which has the characteristics of standardization, modularization and customization. Magnetic control target is 2 inches, customers can choose according to the size of the plated substrate; The power supply is two 500W DC power supplies and a 300W RF power supply. The DC power supply can be used for the preparation of metal film, and the two targets can meet the needs of multi-layer or multiple coatings.

The coater has two high-precision mass flow meters. If customers have other requirements, they can customize the gas path of up to four mass flow meters to meet the complex gas environment construction needs. The instrument comes standard with an advanced turbomolecular pump set with a limit vacuum of up to 1.0E-5Pa, while other types of molecular pumps are available. The gas route of the molecular pump is controlled by multiple solenoid valves, which can realize the opening of the chamber to remove the sample without the pump, greatly improving your work efficiency. This product can be selected as an industrial computer to control the system, in the computer program can achieve the control of vacuum pump group, sputtering power control and other most of the functions, can further improve your experimental efficiency.