The four-target magnetron sputtering coater is a laboratory special coater with two target sites developed by our company. The equipment is equipped with two DC power supplies and two RF power supplies, which can be used to prepare single or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.

Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and fast speed, high coating rate and low sample temperature rise, which is a typical high-speed and low temperature sputtering. The magnetic control target is equipped with a water-cooled interlayer, and the water cooler can effectively take away heat to avoid heat accumulation on the target surface, so that the magnetic control coating can work stably for a long time.

This model adopts the target lower layout, the sample table is above, and the height of the target surface can be continuously adjusted through the program, and can be rotated to heat, excellent performance.